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1. 发明授权

US08178262B2 Method for fabricating color filter layer 有权
标题翻译：彩色滤光片的制作方法
公开(公告)号：US08178262B2
公开(公告)日：2012-05-15
申请号：US12830425
申请日：2010-07-05
申请人： Chun-Hao Tung , Jui-Yin Chung
发明人： Chun-Hao Tung , Jui-Yin Chung
IPC分类号： G02B5/20
CPC分类号： G03F7/0007 , G02F1/133516 , G02F1/136209 , G02F2001/136222
摘要： A method of fabricating a color filter layer is provided. An active device array substrate having an opaque metal pattern formed thereon is provided. A planarization layer covering the opaque metal pattern is formed. A back-side exposure process is performed on the active device array substrate using the opaque metal layer as a mask to form a black matrix thereon, wherein the black matrix defines a plurality of pixel regions. A plurality of color filter patterns is formed in the pixel regions.
摘要翻译：提供了制造滤色器层的方法。提供了具有形成在其上的不透明金属图案的有源器件阵列基板。形成覆盖不透明金属图案的平坦化层。使用不透明金属层作为掩模在有源器件阵列基板上进行背面曝光处理，以在其上形成黑矩阵，其中黑矩阵限定多个像素区域。在像素区域中形成多个滤色器图案。

2. 发明授权

US07956961B2 Pixel structure, display panel, electro-optical apparatus and manufacturing method of the same 有权
标题翻译：像素结构，显示面板，电光装置及其制造方法
公开(公告)号：US07956961B2
公开(公告)日：2011-06-07
申请号：US12111929
申请日：2008-04-29
申请人： Chun-Hao Tung , Kuo-Yu Huang
发明人： Chun-Hao Tung , Kuo-Yu Huang
IPC分类号： G02F1/1335
CPC分类号： G02F1/133553 , G02F1/133555
摘要： A pixel structure disposed on a substrate having a plurality of protrudent patterns is provided. An area where the protrudent patterns are disposed defines a first display area. The arrangement of the protrudent patterns forms a plurality of arc loci. The arc loci have a same arc center disposed at a corner of the first display area. The abovementioned protrudent patterns avails improvement of a displaying effect of the pixel structure.
摘要翻译：提供了设置在具有多个凸起图案的基板上的像素结构。突出图案的布置区域限定第一显示区域。突出图案的布置形成多个弧形轨迹。弧形轨迹具有设置在第一显示区域的角落处的相同弧中心。上述突出图案可以改善像素结构的显示效果。

3. 发明申请

US20110014738A1 LCD TFT array plate and fabricating method thereof 有权
标题翻译： LCD TFT阵列板及其制造方法
公开(公告)号：US20110014738A1
公开(公告)日：2011-01-20
申请号：US12923551
申请日：2010-09-28
申请人： Yeong-Feng Wang , Liang-Bin Yu , Chih-Jui Pan , Chun-Hao Tung
发明人： Yeong-Feng Wang , Liang-Bin Yu , Chih-Jui Pan , Chun-Hao Tung
IPC分类号： H01L21/84
CPC分类号： H01L27/1288 , H01L27/1255
摘要： Lift-off method and half-tone photolithography are used to fabricate LCD TFT array plate. Only two photo masks are used to respectively define a first and a second metal layers to accomplish the LCD TFT array plate.
摘要翻译：用于制造LCD TFT阵列板的剥离法和半色调光刻法。仅使用两个光掩模来分别限定第一和第二金属层以完成LCD TFT阵列板。

4. 发明授权

US07871868B2 LCD TFT array plate and fabricating method thereof 有权
公开(公告)号：US07871868B2
公开(公告)日：2011-01-18
申请号：US11907470
申请日：2007-10-12
申请人： Yeong-Feng Wang , Liang-Bin Yu , Chih-Jui Pan , Chun-Hao Tung
发明人： Yeong-Feng Wang , Liang-Bin Yu , Chih-Jui Pan , Chun-Hao Tung
IPC分类号： H01L21/00 , H01L21/84
CPC分类号： H01L27/1288 , H01L27/1255
摘要： Lift-off method and half-tone photolithography are used to fabricate LCD TFT array plate. Only two photo masks are used to respectively define a first and a second metal layers to accomplish the LCD TFT array plate.

5. 发明申请

US20100291479A1 METHOD FOR FABRICATING COLOR FILTER LAYER 有权
标题翻译：彩色滤光片制作方法
公开(公告)号：US20100291479A1
公开(公告)日：2010-11-18
申请号：US12830425
申请日：2010-07-05
申请人： Chun-Hao Tung , Jui-Yin Chung
发明人： Chun-Hao Tung , Jui-Yin Chung
IPC分类号： G03F7/20
CPC分类号： G03F7/0007 , G02F1/133516 , G02F1/136209 , G02F2001/136222
摘要： A method of fabricating a color filter layer is provided. An active device array substrate having an opaque metal pattern formed thereon is provided. A planarization layer covering the opaque metal pattern is formed. A back-side exposure process is performed on the active device array substrate using the opaque metal layer as a mask to form a black matrix thereon, wherein the black matrix defines a plurality of pixel regions. A plurality of color filter patterns is formed in the pixel regions.
摘要翻译：提供了制造滤色器层的方法。提供了具有形成在其上的不透明金属图案的有源器件阵列基板。形成覆盖不透明金属图案的平坦化层。使用不透明金属层作为掩模在有源器件阵列基板上进行背面曝光处理，以在其上形成黑矩阵，其中黑矩阵限定多个像素区域。在像素区域中形成多个滤色器图案。

6. 发明申请

US20080213949A1 METHOD FOR MANUFACTURING ARRAY SUBSTRATE 有权
标题翻译：制造阵列基板的方法
公开(公告)号：US20080213949A1
公开(公告)日：2008-09-04
申请号：US12005289
申请日：2007-12-27
申请人： Chun-Hao Tung
发明人： Chun-Hao Tung
IPC分类号： H01L21/84
CPC分类号： H01L27/1288 , H01L27/1214
摘要： A method for manufacturing a substrate for a flat panel display device is disclosed. The present method uses photolithography with four masks to manufacture a TFT-LCD. After the third half-tone mask is used, the manufacturing of the TFTs and the defining of the pixel area of the substrate can be completed. The present method can avoid the alignment deviation and the generation of parasitic capacitance happened on the substrate made through the conventional photolithography with five masks. Therefore, the present method can reduce the costs and increase the yield. Moreover, the substrate for the TFT-LCD made by the present method can define a channel region in the semiconductor layer after the second half-tone mask. Hence, the subsequent manufacturing for forming a transparent conductive layer, a source, and a drain can be achieved by wet etching to effectively reduce the non-homogeneous etching for the channel region in the semiconductor layer.
摘要翻译：公开了一种用于制造平板显示装置用基板的方法。本方法使用具有四个掩模的光刻制造TFT-LCD。在使用第三半色调掩模之后，可以完成TFT的制造和衬底的像素区域的限定。本方法可以避免通过具有五个掩模的常规光刻制成的衬底上发生的对准偏差和寄生电容的产生。因此，本方法可以降低成本并提高产量。此外，通过本方法制造的用于TFT-LCD的衬底可以在第二半色调掩模之后限定半导体层中的沟道区。因此，用于形成透明导电层，源极和漏极的后续制造可以通过湿式蚀刻来实现，以有效地减少半导体层中的沟道区域的非均匀蚀刻。

7. 发明申请

US20070154816A1 Mask and fabrication method thereof and application thereof 有权
标题翻译：掩模及其制造方法及其应用
公开(公告)号：US20070154816A1
公开(公告)日：2007-07-05
申请号：US11413735
申请日：2006-04-28
申请人： Chun-Hao Tung
发明人： Chun-Hao Tung
IPC分类号： G03C5/00 , G03F1/00
CPC分类号： G03F1/32 , G03F1/50 , G03F1/54
摘要： A mask including a transparent substrate, a semi-transparent layer and a film layer is provided. The transparent substrate at least has a first region, a second region and a third region. The semi-transparent layer covers the second region and the third region of the transparent substrate and exposes the first region. The film layer covers the halftone layer disposed at the third region, to make the transmittance of the third region lower than that of the second region. The halftone layer and the film can be made of phase shift layers, to form a phase shift mask. Besides, several fabrication methods of the mask are also disclosed to form the above-mentioned mask.
摘要翻译：提供了包括透明基板，半透明层和膜层的掩模。透明基板至少具有第一区域，第二区域和第三区域。半透明层覆盖透明基板的第二区域和第三区域并暴露第一区域。膜层覆盖设置在第三区域的半色调层，以使第三区域的透射率低于第二区域的透射率。半色调层和膜可以由相移层制成，以形成相移掩模。此外，还公开了掩模的几种制造方法以形成上述掩模。

8. 发明申请

US20070059611A1 Mask and manufacturing method thereof 有权
标题翻译：掩模及其制造方法
公开(公告)号：US20070059611A1
公开(公告)日：2007-03-15
申请号：US11444546
申请日：2006-05-31
申请人： Chun-Hao Tung , Chia-Tsung Lee , Hsien-Kai Tseng , Horino Shigekazu
发明人： Chun-Hao Tung , Chia-Tsung Lee , Hsien-Kai Tseng , Horino Shigekazu
IPC分类号： G03C5/00 , G03F1/00
CPC分类号： G03F1/32 , G03F1/54
摘要： A mask and a manufacturing method thereof are provided. A transparent substrate having three regions is provided first. A non-transmitting layer is formed in a first region of the transparent substrate. Then, a first photoresist layer is formed on the transparent substrate, and the first photoresist layer exposes a second region of the transparent substrate. Next, a first transmitting layer is formed on the transparent substrate and the first photoresist layer. Finally, the first photoresist layer is removed. The first transmitting layer on the first photoresist layer is removed at the same time and the first transmitting layer in the second region of the transparent substrate is remained and a third region of the transparent substrate is exposed. A lift-off process is used in the mask manufacturing method of the present invention to form the transmitting layer.
摘要翻译：提供了一种掩模及其制造方法。首先设置具有三个区域的透明基板。在透明基板的第一区域中形成非透光层。然后，在透明基板上形成第一光致抗蚀剂层，第一光致抗蚀剂层露出透明基板的第二区域。接下来，在透明基板和第一光致抗蚀剂层上形成第一透光层。最后，去除第一光致抗蚀剂层。同时去除第一光致抗蚀剂层上的第一透射层，并且保留透明基板的第二区域中的第一透射层，并露出透明基板的第三区域。在本发明的掩模制造方法中使用剥离处理来形成透射层。

9. 发明授权

US08551822B2 Method for manufacturing array substrate 有权
标题翻译：阵列基板的制造方法
公开(公告)号：US08551822B2
公开(公告)日：2013-10-08
申请号：US12005289
申请日：2007-12-27
申请人： Chun-Hao Tung
发明人： Chun-Hao Tung
IPC分类号： H01L21/00
CPC分类号： H01L27/1288 , H01L27/1214
摘要： A method for manufacturing a substrate for a flat panel display device is disclosed. The present method uses photolithography with four masks to manufacture a TFT-LCD. After the third half-tone mask is used, the manufacturing of the TFTs and the defining of the pixel area of the substrate can be completed. The present method can avoid the alignment deviation and the generation of parasitic capacitance happened on the substrate made through the conventional photolithography with five masks. Therefore, the present method can reduce the costs and increase the yield. Moreover, the substrate for the TFT-LCD made by the present method can define a channel region in the semiconductor layer after the second half-tone mask. Hence, the subsequent manufacturing for forming a transparent conductive layer, a source, and a drain can be achieved by wet etching to effectively reduce the non-homogeneous etching for the channel region in the semiconductor layer.
摘要翻译：公开了一种用于制造平板显示装置用基板的方法。本方法使用具有四个掩模的光刻制造TFT-LCD。在使用第三半色调掩模之后，可以完成TFT的制造和衬底的像素区域的限定。本方法可以避免通过具有五个掩模的常规光刻制成的衬底上发生的对准偏差和寄生电容的产生。因此，本方法可以降低成本并提高产量。此外，通过本方法制造的用于TFT-LCD的衬底可以在第二半色调掩模之后限定半导体层中的沟道区。因此，用于形成透明导电层，源极和漏极的后续制造可以通过湿式蚀刻来实现，以有效地减少半导体层中的沟道区域的非均匀蚀刻。

10. 发明申请

US20130120283A1 TOUCH SENSOR PANEL HAVING AN INDEX MATCHING PASSIVATION LAYER 有权
公开(公告)号：US20130120283A1
公开(公告)日：2013-05-16
申请号：US13371359
申请日：2012-02-10
申请人： Chun-Hao TUNG , EnkhAmgalan DORJGOTOV , Masato KUWABARA , Sunggu KANG , Cheng CHEN , John Z. ZHONG
发明人： Chun-Hao TUNG , EnkhAmgalan DORJGOTOV , Masato KUWABARA , Sunggu KANG , Cheng CHEN , John Z. ZHONG
IPC分类号： G06F3/041 , B32B37/14 , B32B37/12
CPC分类号： G06F3/041 , B32B37/12 , B32B2457/208 , G02B1/11 , G02B1/111 , G06F2203/04103 , Y10T156/10 , Y10T428/24942
摘要： Touch sensor panels typically include a plurality of layers that can be stacked on top of each other. When the touch sensor panel is used in a bright environment, incident light can hit the interfaces between those layers of the stackup having mismatched refractive indices and can reflect off those interfaces. The light reflected from those interfaces can give rise to the appearance of fringes on the touch sensor panel, which can be visually distracting. In order to reduce the appearance of these fringes, embodiments of the disclosure are directed to the addition of an index matching passivation layer between a conductive layer of traces and an adhesive layer in the touch sensor panel stackup.

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